 |
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 1946 |
Thin Film Engineering Laboratory was incorporated in Zushi City, Kanagawa Prefecture, which was the first commercial producer of antireflection coatings on optical lenses. |
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| 1952 |
Reorganized into Shonan Optical Thinfilms Laboratory and transferred to Togoshi, Shinagawa-ku, Tokyo. |
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| 1960 |
Multilayer thinfilm division was separated from Shonan Optical Thinfilms Laboratory and incorporated into Vacuum Optics Corporation of Japan. |
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| 1961 |
Commissioned by Reserch and Development Corporation of Japan(JRDC) to develop Multilayer thinfilm optical coatings. The first plant was constructed in Togoshi, Shinagawa-ku, Tokyo to start the development program. |
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| 1963 |
Secceeded in the development of Multilayer thinfilm coatings. Started their commercial production after the successful development was authorized by the Development Council of JRDC. Started the prototype production of "Shading spectacle lens" with a subsidy from Tokyo Regional Bureau of Internatioinal Trade and Industry(TRBITI) as an export and prototype production incentive for small and midium-sized corporations. |
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| 1964 |
Increased capital up to 3 million yen. Started the production of photoelectric film thickness monitors after the acquisition of the patent license of "Photoelectric apparatus and methods for the monitoring of coating thickness" from the Agency of Industrial Science and Technology. |
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| 1969 |
Increased capital up to 5 million yen. Constructed a new plant in Nakabata, Gotenmba City, Shizuoka Prefecture. Received a subsidy from the New Technology Development Foundation to develop the "Prodction technology of complete antireflection films". |
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| 1971 |
Increased capital up to 10 million yen. Received a subsidy for technological innovation from TRBITI for the prototype production of "High quality laser mirrors". |
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| 1977 |
Increased capital up to 20 million yen. Expanded Gotemba Plant. Received a subsidy of technological innovation from TRBITI for the study on "Excimer laser mirrors". |
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| 1979 |
Increased capital up to 30 million yen. Acquired the patent license of "High frequency ion plating" from JRDC for the production of interference coatings. |
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| 1980 |
Received a subsidy of technological innovation from TRBITI for the prototype production of "High-durability cold mirrors". |
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| 1983 |
Increased capital up to 40 million yen. Constructed Gotemba Second Plant. |
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| 1985 |
Succeeded in the development of the plasma ion process. |
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| 1986 |
Increased capital up to 60 million yen. Incorporated lse Vacuum Optics Corporation in Hisai City, Mie Prefecture. |
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| 1987 |
Increased capital up to 70 million yen. |
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| 1989 |
Expanded the plant of Ise Vacuum Optics Corporation. |
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| 1992 |
Asahi Techno Glass Corporation participated in capital and management. |
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| 1998 |
Merged Ise Vacuum Optics Corporation as the Mie Plant. Increased capital up to 210 million yen. |
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| 2003 |
Started production at Thai Iwaki Glass Co.,Ltd. |
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